Publications

JOURNAL PUBLICATIONS

2017

  1. N. Mohammad, M. Meem, X. Wan and R. Menon, “Full-color, large area, transmissive holograms enabled by multi-level diffractive optics,” Sci. Rep. (in press).
  2. P. Wang and R. Menon, “Computational multi-spectral video imaging,” arXiv:1705.09321v1 [physics.optics] (open access).
  3. A. Meiri, C. Ebeling, J. Martineau, Z. Zalevsky, J. Gerton and R. Menon, “Interference based localization of single emitters,” Opt. Exp. (in press).
  4. G. Kim, K. Isaacson, R. Palmer and R. Menon, “Lensless photography with only an image sensor,” arXiv:1702.06619 [cs.CV] (open access)
  5. G. Kim, N. Nagarajan, E. Pastuzyn, K. Jenks, M. Capecchi, J. Sheperd and R. Menon,”Deep-brain imaging via epi-fluorescence computational cannula microscopy,” Scientific Reports, 7:44791 DOI: 10.1038/srep44791  (2016). (open-access link).
  6. G. Kim and R. Menon, “Numerical analysis of computational cannula microscopy,” Appl. Opt. 56(9), D1-D7 (2017). (link)

2016

  1. P. Wang, N. Mohammad and R. Menon, “Diffractive flat-lenses enable ultra-broadband focusing,” Optics and Photonics News, Dec. 1 2016 (open-access link). [Selected for Optics in 2016]
  2. B. Shen, R. C. Polson and R. Menon, “Increasing the density of integrated-photonic circuits via nanophotonic cloaking,” Nature Communications. DOI: 10.1038/ncomms13126 (open access link).
  3. N. Mohammad, M. Schulz, P. Wang, and R. Menon, “Outdoor measurements of a photovoltaic system using diffractive spectrum-splitting & concentration,” AIP Advances 6, 095311 (2016). (open access link)
  4. A. Majumder, X. Wan, B. Pollock, T. L. Andrew and R. Menon, “Reverse-Absorbance-Modulation-Optical Lithography for optical nanopatterning at low light levels,” AIP Advances 6, 065312 (2016). (open access link)
  5. P. Wang, N. Mohammad and R. Menon, “Chromatic-aberration-corrected diffractive lenses for ultra-broadband focusing,” Nature Scientific Reports 6, 21545 (2016) (open access link)
  6. B. Shen, P. Wang, R. C. Polson and R. Menon, “Reply to on nanostructured silicon success,” Nature Photonics 143(3) p. 143 (2016) (link).
  7. A. Majumder, P. Helms, T. L. Andrew, and R. Menon, “A comprehensive simulation model of the performance of photochromic films in Absorbance-Modulation-Optical Lithography,” AIP Advances 6, 035210 (2016). (link)

2015

  1. B. Shen, P. Wang, R. C. Polson and R. Menon, “Digital metmaterials shrink photonic devices,” Optics and Photonics News, Dec 1, 2015 [Selected for Optics in 2015] (link).
  2. B. Shen, R. C. Polson and R. Menon, “Metamaterial-waveguide bends with effective bend radius < λ0/2,” Opt. Lett. 40(24) 5750-5753 (2015). (link)
  3. Spotlight on Optics summary of “Gold triple-helix mid-infrared metamaterial by STED-inspired laser lithography,” A. Majumder and R. Menon, Opt. Lett. (2015). (link).
  4. P. Wang and R. Menon, “Ultra-high sensitivity color imaging via a transparent diffractive-filter array and computational optics,” Optica 2(11) 933-939 (2015). (link)
  5. X. Wan and R. Menon, “Proximity-effect correction for 3D single-photon optical lithography,” Appl. Opt. 55(3) pp. A1-A7 (2015). (link)
  6. R. Menon and B. Shen, “Digital metamaterials shrink integrated photonic devices,” 27 August 2015, SPIE Newsroom. DOI: 10.1117/2.1201508.006046 (2015) (link).
  7. B. Shen, R. C. Polson and R. Menon, “Broadband asymmetric light transmission via all-dielectric digital metamaterials,” Opt. Exp. 23(16) 20961-20970 (2015). (open-access link).
  8. G. Kim, N. Nagarajan, M. Capecchi and R. Menon, “Cannula-based computational fluorescence microscopy,” Appl. Phys. Lett. 106, 261111 (2015). (open-access link).
  9. A. B. Zoubi, et al., “Fast imaging in cannula microscope using orthogonal matching pursuit,” Proceedings of the 2015 IEEE Signal Processing and Signal Processing Education Workshop.
  10. B. Shen, P. Wang, R. C. Polson and R. Menon, “An integrated-nanophotonic polarization beamsplitter with 2.4μm X 2.4μm^2 footprint,” Nature Photonics, 9, 378-382 (2015). (link)
  11. C. G. Ebeling, A. Meiri, J. Martineau, Z. Zalevsky, J. M. Gerton and R. Menon, “Increased localization precision by interference fringe analysis,” Nanoscale7, 10430-10437 (2015).  (link)
  12. P. Wang and R. Menon, “Optical lithography on oblique and multi-plane surfaces using diffractive phase masks,” Journal of Micro/Nanolithography, MEMS and MOEMS (JM3) 14(2), 023507 (2015).
  13. A. Majumdar, F. Masid, B. Pollock, T. L. Andrew and R. Menon, “Super-resolution optical lithography via barrier-free absorbance modulation,” Opt. Exp 23(9), 12244-12250 (2015). (open access link)
  14. T. Aytug, et al., “Monolithic graded-refractive-index glass-based antireflective coatings: Broadband omnidirectional light harvesting and self-cleaning characteristics,” J. Mater. Chem. C 3, 5440-5449 (2015). (link)
  15. B. Shen, R. C. Polson and R. Menon, “Integrated digital metamaterials enables ultra-compact optical diodes,” Opt. Exp. 23, 8, 10847-10855 (2015). (open-access link)

2014

  1.  G. Kim and R. Menon, “Turning a needle into a microscope,” Optics and Photonics News, December 1, 2014. [Selected for Optics in 2014] (link).
  2. P. Cantu, T. L. Andrew and R. Menon, “Patterning via Optical-Saturable Transformations: A review and simple simulation model,” Appl. Phys. Lett. 105, 193105 (2014). (link)
  3. B. Shen, P. Wang, R. C. Polson and R. Menon, “Integrated metamaterials for efficient, compact free-space-to-waveguide coupling,” Opt. Exp. 22(22) 27175-27182 (2014). (link)
  4. B. Shen, P. Wang, R. C. Polson and R. Menon, “An ultra-high efficiency MetaOpticaCoverNov2014_11-14material Polarizer,” Optica 1(5) 356-360 (2014). (link) [Selected for cover image]
  5. X. Wan, B. Shen and R. Menon, “Diffractive lens design for Optimized Focusing,” J. Opt. Soc. Am. A 31(12) BB27-33 (2014). (link) [Top downloads for December 2014]
  6. P. Cantu, T. L. Andrew and R. Menon,”Patterning via Optical Saturable Transitions – Fabrication and Characterization,” J. Vis. Exp. (94), e52449, doi:10.3791/52449 (2014). (link) 
  7. N. Mohammad, P. Wang, D. J. Friedman and R. Menon, “Enhancing photovoltaic output power by 3-band spectrum-splitting & concentration using a diffractive micro-optic,” Opt. Exp. 22(S6) A1519-A1525 (2014). (link)
  8. P. Wang and R. Menon, “Computational spectroscopy via singular-value decomposition and regularization,” Opt. Exp. 22(18) 21541-21550 (2014). (link)
  9. Ganghun Kim and R. Menon, “An ultra-small 3D computational microscope,” Appl. Phys. Lett. 105 061114 (2014). (link)
  10. P. Wang and R. Menon, “Computational spectroscopy based on a broadband diffractive optic,” Opt. Exp. 22(12), 14575-14587 (2014). (link)
  11. P. Wang, J-A. Dominguez-Caballero, D. Friedman and R. Menon, “A new class of multi-bandgap high efficiency photovoltaics enabled by broadband diffractive optics,” Progress in Photovoltaics: Research & Applications 23(9) 1073-1079 (2015). (link)
  12. P. Wang, C. G. Ebeling, J. Gerton and R. Menon, “Hyper-spectral imaging in scanning-confocal-fluorescence microscopy using a novel broadband diffractive optic,” Opt. Commun. Vol 324, p. 73-80 (2014).  (link)
  13. B. Shen, P. Wang and R. Menon, “Optimization and analysis of 3D nanostructures for power-density enhancement in ultra-thin photovoltaics under oblique illumination,” Opt. Exp. 22(52) A311-A319 (2014). (link)
  14. R. Menon, “Enhancing the efficiency of photovoltaics with photonics,” SPIE Newsroom DOI: 10.1117/2.1201401.005289 (2014) (invited review article) (link)
  15. T. Ilovitsh, A. Meiri, C. G. Ebeling, R. Menon, J. M. Gerton, E. M. Jorgensen, and Z. Zalevsky, “Improved localization accuracy in stochastic super-resolution fluorescence microscopy by K-factor image deshadowing,” Biomed. Opt. Exp. 5(1) 224-258 (2014). (link).

2013

  1. M. W. Walsh, R. Menon, F. Zhang and H. I. Smith,  “Maskless Photolithography,”  Chapter 6 in “Nanotechnology” by Woodhead Publishing, (2013).
  2. P. Wang and R. Menon, “Optimization of generalized dielectric nanostructures for enhanced light trapping in thin-film photovoltaics via boosting the local density of optical states,” Opt. Exp. 22 S1 A99-A110 (2013). (link).
  3. P. Cantu, T. L. Andrew and R. Menon, “Nanopatterning of diarylethene films via selective dissolution of one photoisomer,” Appl. Phys. Lett. 103, 173112 (2013). (link)
  4. G. Pariani, R. Castagna, R. Menon, C. Bertarelli and A. Bianco, “Modeling absorbance-modulation optical lithography in photochromic films,” Opt. Lett. 38(16) 3024-3027 (2013). (link)
  5. G. Kim, J-A. Dominguez-Caballero, H. Lee, D. Friedman and R. Menon, “Increased photovoltaic power output via diffractive spectrum separation,” Phys. Rev. Lett. 110, 123901 (2013). (link)
  6. P. Wang and R. Menon, “Optimization of periodic nanostructures for enhanced light-trapping in ultra-thin photovoltaics,” Opt. Exp. 21, 5, 6274-6285 (2013).
  7. F. Masid, T. L. Andrew and R. Menon, “Optical patterning of features with spacing below the far-field diffraction limit using absorbance modulation,” Opt. Exp. 21, 4 5209-5214 (2013).

2012

  1. P. Wang and R. Menon, “Simulation and analysis of the angular response of 1D dielectric nanophotonic light-trapping structures in thin-film photovoltaics,” Opt. Exp. 20 (S4), A545 (2012).
  2. P. Cantu, N. Brimhall, T. L. Andrew, R. Castagna, C. Bertarelli and R. Menon, “Subwavelength nanopatterning of photochromic diarylethene films,” Appl. Phys. Lett. 100, 183103 (2012).
  3. G. Kim, J-A. Dominguez-Caballero and R. Menon, “Design and analysis of multi-wavelength diffractive optics,” Opt. Exp.20(2), 2814-2823 (2012).
  4. P. Wang and R. Menon, “Simulation and optimization of 1D periodic dielectric nanostructures for light-trapping,” Opt. Exp.20(2), 1849 (2012).

2011 & prior

  1. N. Brimhall, T. L. Andrew, R. V. Manthena and R. Menon, “Breaking the far-field diffraction limit in optical nanopatterning via repeated photochemical and electrochemical transitions in photochromic molecules,”Phys. Rev. Lett. 107, 205501 (2011).
  2. H-Y. Tsai, S. W. Thomas, III and R. Menon, “Parallel scanning optical nanoscopy with optically confined probes,” Opt. Exp. 18(15), 16015 (2010).
  3. R. Menon, “Towards diffraction-unlimited optical nanopatterning,” Optics and Photonics News, December 17, 2009. [Selected for Optics in 2009].
  4. T. L. Andrew, H-Y. Tsai and R. Menon, “Confining light to deep sub-wavelength dimensions to enable optical nanopatterning,” Science, 324, 917 (2009).
  5. R. Menon, P. Rogge, and H-Y. Tsai, “Design of diffractive lenses that generate optical nulls without phase singularities,” J. Opt. Soc. Am. A, 26(2), 297 (2009).
  6. H-Y. Tsai, E. E. Moon and R. Menon, “Far-field optical imaging at the nanoscale via Absorbance Modulation,” Novel Techniques in Microscopy, OSA Technical Digest (2009).
  7. H-Y. Tsai, H. I. Smith, and R. Menon, “Reduction of focal-spot size using dichromats in absorbance modulation,” Opt. Lett., 33(24), 2916 (2008).
  8. F. Y. Ogrin, E. Sirotkin, G. van der Laan, G. Beutier, C. A. Ross, W. Jung, and R. Menon, “Soft X-ray resonant magnetic scattering investigation of stable magnetic configurations in patterned rings,” J. Appl. Phys., 103, 07E909 (2008).
  9. H-Y. Tsai, G. M. Wallraff, and R. Menon, “Spatial-frequency multiplication via absorbance modulation,” Appl. Phys. Lett., 91(9), 094103 (2007).
  10. R. Menon, H-Y Tsai and S. W. Thomas III, “Far-field generation of localized light fields using absorbance modulation,” Phys. Rev. Lett., 98, 043905 (2007).
  11. R. Menon, H-Y Tsai and H. I. Smith, “Patterning and Imaging at the nanoscale with far-field optics via absorbance modulation,” Photonic Metamaterials: From Random to Periodic, OSA Technical Digest (Optical Society of America, 2007).
  12. H-Y Tsai, H. I. Smith, and R. Menon, “Fabrication of spiral-phase diffractive elements using scanning electron-beam lithography,” J. Vac. Sci. Technol. B, 25(6), 2068-2071 (2007).
  13. F. Y. Ogrin, S. M. Weekes, B. Cubitt, A. Wildes, A. Drew, C. A. Ross, W. Jung, R. Menon, and B. Toperverg, “Polarised neutron reflectivity investigation of periodic magnetic rings,” IEEE T. Magn., 43(6), 2731-2733 (2007).
  14. M. D. Galus, E. E. Moon, H. I. Smith and R. Menon, “Replication of diffractive-optical arrays using photocurable nanoimprint lithography,” J. Vac. Sci. Technol. B, 24 (6), 2960-2963 (2006).
  15. R. Menon, and H. I. Smith, “Absorbance-modulation optical lithography,” J. Opt. Soc. Am. A, 23(9), 2290-2294 (2006).
  16. H. I. Smith, R. Menon, A. Patel, D. Chao, M. Walsh, and G. Barbastathis “Zone-plate-array lithography: A low-cost complement or competitor to scanning-electron-beam lithography,” Microelectron. Eng., 83(4-9), 956-961 (2006).
  17. R. Menon, D. Gil, and H. I. Smith, “Experimental characterization of focusing by high-numerical-aperture zone plates,” J. Opt. Soc. Am. A, 23(3), 567-571 (2006).
  18. D. Chao, A. Patel, T. Barwicz, H. I. Smith, and R. Menon, “Immersion Zone-Plate-Array Lithography,” J. Vac. Sci. Technol. B, 23(6), 2657-2661 (2005).
  19. W. Jung, F. J. Castaño, D. Morecroft, C. A. Ross, R. Menon, and H. I. Smith, “Magnetization reversal in single-layer and exchange-biased elliptical-ring arrays,” J. Appl. Phys., 97(10), 10K113-1-3 (2005).
  20. R. Menon, D. Gil, and H. I. Smith, “Photon-sieve lithography,” J. Opt. Soc. Am. A, 22(2), 342-345 (2005).
  21. H. I. Smith, R. Menon, A. Patel, D. Chao, M. Walsh, and G. Barbastathis “Enabling nanoscale science and engineering via highly flexible, low-cost, maskless lithography,” Proc. SPIE, v. 6002, 60020B (2005).
  22. R. Menon, A. Patel, D. Chao, M. Walsh, and H. I. Smith, “Zone-Plate- Array Lithography (ZPAL): Optical Maskless Lithography for cost-effective patterning,” Emerging Lithographic Technologies IX, Proc. SPIE, v. 5751, 330-339 (2005).
  23. R. Menon, A. Patel, and H. I. Smith, “Maskless optical lithography using MEMS-based spatial light modulators,” MOEMS Display and Imaging Systems III, Proc. SPIE, v. 5721, 53-63 (2005).
  24. R. Menon, A. Patel, D. Gil, and H. I. Smith, “Maskless lithography,” Materials Today, 26-33, Feb 2005.
  25. R. Menon, A. Patel, E. E. Moon, and H. I. Smith, “An alpha-prototype system for zone-plate-array lithography,” J. Vac. Sci. Technol. B, 22(16), 3032-3037 (2004).
  26. R. Menon, E. E. Moon, M. K. Mondol, F. J. Castano, and H. I. Smith, “Scanning-spatial-phase alignment for zone-plate-array lithography,” J. Vac. Sci. Technol. B, 22(16), 3382-3385 (2004).
  27. W. Jung, F. J. Castano, C. A. Ross, R. Menon, A. Patel, E. E. Moon, M. K. Mondol, and H. I. Smith, “Elliptical ring magnetic arrays fabricated using zone-plate-array lithography,” J. Vac. Sci. Technol. B, 22(16), 3335-3338 (2004).
  28. D. Gil, R. Menon, and H. I. Smith, “The promise of diffractive optics in maskless lithography,” Microelectron. Eng., v. 73-74, 35-41 (2004).
  29. R. Menon, A. Patel, G. Barbastathis, D. Gil, and H. I. Smith, “Maskless zone-plate-array lithography (ZPAL): For enhanced creativity in nanostructures fabrication and research ,” Digest of papers: Microprocesses and Nanotechnology, 338 (2004).
  30. R. Menon, D. Gil, D. J. D. Carter, A. Patel and H. I. Smith, “Zone-Plate Array Lithography (ZPAL): A maskless fast-turn-around system for Microoptic Device Fabrication,” MOEMS Display and Imaging Systems, Proc. SPIE v. 4984, 10-17 (2003).
  31. D. Gil, R. Menon and H. I. Smith, “The Case for Diffractive Optics in Maskless Lithography,” J. Vac. Sci. Technol. B, 21(6), 2810-2814, (2003).
  32. D. Gil, R. Menon and H. I. Smith, “Fabrication of High-Numerical Aperture Phase Zone Plates with a single Lithography Exposure and No Etching,” J. Vac. Sci. Technol. B, 21(6), 2956-2960 (2003).
  33. D. Gil, R. Menon, X. Tang, H. I. Smith, and D. J. D. Carter, “Parallel Maskless Optical Lithography for Prototyping, Low-Volume Production, and Research,” J. Vac. Sci. Technol. B, 20(6), 2597-2601 (2002).
  34. R. A. Forber, Z. W. Chen, R. Menon, R. Grygier, S. Mrowka, I. C. E. Turcu, C. J. Gaeta, K. Cassidy, and Henry I. Smith, “Collimated Point-Source X-ray Nanolithography,” J. Vac. Sci. Technol. B, 20(6), 2984-2990 (2002).
  35. R. Menon, D. J. D. Carter, D. Gil, and H. I. Smith, “Zone-Plate-Array Lithography (ZPAL): Simulations for System Design,” X-Ray Microscopy: Proc. of the VIth International Conference on X-Ray Microscopy, 647-652, American Institute of Physics (2000).
  36. D. J. D. Carter, D. Gil, R. Menon, and H. I. Smith, “Maskless nanolithography with diffractive optics: Zone-Plate-Array lithography (ZPAL),” Trends in Optics and Photonics: Diffractive Optics and Micro-Optics. v. 41, 105-107, Opt. Soc. America (2000).
  37. H. I. Smith, D. J. D. Carter, M. Meinhold, E. E. Moon, M. H. Lim, J. Ferrera, M. Walsh, D. Gil, and R. Menon, “Soft X-rays for Deep Sub-100 nm Lithography, With and Without Masks,” Microelectron. Eng., 53, 77-84 (2000).
  38. D. Gil, R. Menon, D. J. D. Carter, and H. I. Smith, “Lithographic Patterning and Confocal Imaging with Zone Plates,” J. Vac. Sci. Technol. B, 18(6), 2881-2885 (2000).
  39. H. I. Smith, D. J. D. Carter, J. Ferrera, D. Gil, J. T. Hastings, M. H. Lim, M. Meinhold, R. Menon, E. E. Moon, C. A. Ross, T. Savas, M. Walsh, and F. Zhang, “Soft X-rays for Deep Sub-100 nm Lithography, With and Without Masks,” Proc. Materials Research Society Symposium, v. 584, 11-21 (2000).
  40. D. J. D. Carter, D. Gil, R. Menon, I. J. Djomehri, and H. I. Smith, “Zone-Plate Array Lithography (ZPAL): A New Maskless Approach,” Emerging Lithographic Technologies III: Proc. SPIE, v. 3676, 324-332 (1999).
  41. D. J. D. Carter, D. Gil, R. Menon, M. K. Mondol, H. I. Smith, and E. H. Anderson “Maskless Parallel Patterning with Zone-Plate Array Lithography (ZPAL),” J. Vac. Sci. Technol. B, 17(6), 3449-3452 (1999).
  42. T. C. Au-Yeung, C. H. Kam, Z. F. Shi, R. Menon, and R. A. Straughan, “Energy levels of impurity magnetopolarons in parabolic quantum wires,” Phys. Lett. A, 238, 66-72 (1998).
  43. T. C. Au-Yeung, C. H. Kam, R. Menon, and Z. F. Shi, “Bound state energy calculations of magnetopolarons in strongly confined parabolic quantum wires,” Phys. Lett. A, 250(1-3), 185-190 (1998).
  44. T. C. Au-Yeung, Z. F. Shi, C. H. Kam, R. Menon, and R. A. Straughan, “A variational perturbative approach to the impurity magnetopolarons in parabolic quantum wires,” J. Phys. Soc. Jpn., 67(2), 519-524 (1998).

BOOK CHAPTERS

  1. H. I. Smith, R. Menon, M. Walsh, and F. Zhang, “Zone-Plate-Array Lithography,” Book chapter in Emerging Lithographic Technologies for Nanopatterning, CRC Press/Taylor & Francis (in preparation).

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